Talk:Buffered oxide etch
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Untitled[edit]
Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). ==> Silicon Nitride is rarely soluble in BOE.
Chemical reaction?[edit]
What is the chemical reaction involved in the etch process?--Srleffler (talk) 16:07, 24 March 2014 (UTC)